Laser Microscopy

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reflx™ 物鏡 reflx™ 物鏡
TECHSPEC®組件由愛特蒙特光學設計、指定或製造。進一步瞭解
  • 領先業界的 19 至 31mm 工作距離
  • 由愛特蒙特光學設計及製造,適用於聚焦或成像應用
  • 主動對準以實現最佳效能
  • 190nm 至 11μm 的超寬光譜帶,無色像差
  • 亦提供 高效能reflx™物鏡
高效能reflx™物鏡 高效能reflx™物鏡
TECHSPEC®組件由愛特蒙特光學設計、指定或製造。進一步瞭解
  • 繞射極限效能:λ/14 RMS 穿透波前
  • 採用錐形設計,在入射角為45°時可取得更大的間隙
  • 採用曲線型十字軸支架,以降低繞射影響
  • 亦提供 reflx™反射物镜 物鏡
mitutoyo NIR, NUV, 及 UV 遠場補正物鏡 mitutoyo NIR, NUV, 及 UV 遠場補正物鏡
Top Seller
  • 非常適用於紫外線、可見光及近紅外光譜範圍的亮場成像
  • 對Nd:YAG雷射光具有出眾的效能
  • 具有廣泛的光譜範圍
Mitutoyo 遠場校正長工作距離物鏡 Mitutoyo 遠場校正長工作距離物鏡
Top Seller
  • 工作距離長
  • 亮場檢測
  • 高品質平場複消色差設計
  • 整個像場平場結構
Adjustable ReflX™ Objectives Adjustable ReflX™ Objectives
TECHSPEC®組件由愛特蒙特光學設計、指定或製造。進一步瞭解
Clearance
  • Units Adjustable for Precision Alignment
  • Various Coating Options Available for Specific Wavelength Ranges
  • Finite Conjugate Design and RMS Threading Integrate Easily in Many Objective Setups

Laser Optics

Laser Microscopy is used to image samples through the use of focused laser beams. In general Laser Microscopy applications, a sample is scanned by a focused laser beam and the intensity of the reflected beam is converted to a digital image. Confocal microscopy, also known as confocal laser scanning microscopy, offers various advantages over traditional wide-field microscopy, such as enhanced resolution, targeted imaging location, and higher image depth. Common laser microscopy techniques include super-resolution microscopy, fluorescence microscopy, and two- or multi-photon microscopy.

Edmund Optics offers a range of Laser Microscopy objectives in finite and infinite conjugate styles for use with common laser wavelengths, such as those of popular laser diodes or Nd:YAG harmonics. Our TECHSPEC® ReflX™ Objectives are reflective microscope objectives that can efficiently focus laser light without introducing any chromatic aberration. These objectives feature a rugged design to withstand exposure to moderate heat or abrasion and are ideal in applications that range from FTIR spectroscopy to semiconductor inspection. TECHSPEC® High Performance ReflX™ Objectives are also available, providing better peak-to-valley transmitted wavefront and a design that allows for angles of incidence up to 45°. Mitutoyo Objectives, with excellent performance at Nd:YAG harmonics, are ideal for integration into semiconductor inspection or laser cutting applications.

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