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Laser Microscopy

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reflx™ 物鏡
reflx™ 物鏡
  • 領先業界的 19 至 31mm 工作距離
  • 由愛特蒙特光學設計及製造,適用於聚焦或成像應用
  • 主動對準以實現最佳效能
  • 190nm 至 11μm 的超寬光譜帶,無色像差
  • 繞射極限效能:λ/14 RMS 穿透波前
  • 採用錐形設計,在入射角為45°時可取得更大的間隙
  • 採用曲線型十字軸支架,以降低繞射影響
  • 領先業界的 24 至 31mm 工作距離
mitutoyo NIR, NUV, 及 UV 遠場補正物鏡 mitutoyo NIR, NUV, 及 UV 遠場補正物鏡
  • 非常適用於紫外線、可見光及近紅外光譜範圍的亮場成像
  • 對Nd:YAG雷射光具有出眾的效能
  • 具有廣泛的光譜範圍
MITUTOYO 無線補正長工作距離物鏡 MITUTOYO 無線補正長工作距離物鏡
  • 工作距離長 (100X物鏡的工作距離為6mm)
  • 高品質平場複消色差結構設計
  • 視場範圍內成像均勻
硒化鋅紅外線 (IR) 聚焦物鏡 硒化鋅紅外線 (IR) 聚焦物鏡
  • 對最大5mm的光束具有最大的耦合效率
  • 與氦氖雷射輕鬆搭配使用
  • 適用於2 - 12μm 範圍
Adjustable ReflX™ Objectives
Adjustable ReflX™ Objectives
  • Units Adjustable for Precision Alignment
  • Various Coating Options Available for Specific Wavelength Ranges
  • Finite Conjugate Design and RMS Threading Integrate Easily in Many Objective Setups

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Laser Optics

Laser Microscopy is used to image samples through the use of focused laser beams. In general Laser Microscopy applications, a sample is scanned by a focused laser beam and the intensity of the reflected beam is converted to a digital image. Confocal microscopy, also known as confocal laser scanning microscopy, offers various advantages over traditional wide-field microscopy, such as enhanced resolution, targeted imaging location, and higher image depth. Common laser microscopy techniques include super-resolution microscopy, fluorescence microscopy, and two- or multi-photon microscopy.

Edmund Optics offers a range of Laser Microscopy objectives in finite and infinite conjugate styles for use with common laser wavelengths, such as those of popular laser diodes or Nd:YAG harmonics. Our TECHSPEC® ReflX™ Objectives are reflective microscope objectives that can efficiently focus laser light without introducing any chromatic aberration. These objectives feature a rugged design to withstand exposure to moderate heat or abrasion and are ideal in applications that range from FTIR spectroscopy to semiconductor inspection. TECHSPEC® High Performance ReflX™ Objectives are also available, providing better peak-to-valley transmitted wavefront and a design that allows for angles of incidence up to 45°. Mitutoyo Objectives, with excellent performance at Nd:YAG harmonics, are ideal for integration into semiconductor inspection or laser cutting applications.

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