25.4mm Dia., 1030nm Highly-Dispersive Ultrafast Mirror with Reduced Thermal Lensing

See More by UltraFast Innovations (UFI)

UltraFast Innovations (UFI) 1030nm Highly-Dispersive Ultrafast Mirrors with Reduced Thermal Lensing

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Stock #17-070 5-7 Days
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NT$34,055
Qty 1-9
NT$34,055
Qty 10+
NT$30,660
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下載產品資料
Wedge (arcmin):
10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Coating Specification:
Ravg >99.5% @ 1010 - 1050nm (5° AOI, p-polarization)
GDD Specification:
-1000fs2 @ 1010 - 1050nm (5° AOI, p-polarization)
Wavelength Range (nm):
1010 - 1050
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Highly Dispersive (1010-1050nm)
Design Wavelength DWL (nm):
1030
Diameter (mm):
25.40 +0.00/-0.05
Thickness (mm):
6.35 ±0.20
Angle of Incidence (°):
5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Damage Threshold, Reference: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
>0.3 J/cm2 for 1 ps @ 5 kHz rep rate @ 1030nm

Regulatory Compliance

RoHS 2015:
Certificate of Conformance:
Reach 235:

產品系列說明

  • 減少熱透鏡效應的 Ultrafast 高色散鍍膜
  • 在 5° 入射角達到 -1000 fs2 的高負 GDD
  • 在 50nm 頻寬提供 99.5% 以上的最低反射率(P 偏振)
  • 產生高功率超快雷射脈衝的理想選擇

減少熱透鏡效應的 UltraFast Innovations (UFI) 1030nm 高色散超快反射鏡,具備可忽略不計的熱效應,提供 -1000fs2 的 GDD 及低損耗。如果作用中的增益媒介在光束軸沿線的溫度比媒介其餘區域更高,就可能會產生熱透鏡效應,造成橫向的折射指數梯度。這可能會讓雷射腔無法對準,對光束指向造成不同的雷射模式輪廓及漂移。本系列反射鏡可高度控制光束穩定性,在 1010 - 1050nm 提供 99.5% 以上的反射率(P 偏振),可在設計的 5° 入射角 (AOI) 情況下,於一對超快反射鏡之間產生最大數量的反射,並可進行脈衝壓縮同時限制熱透鏡效應。減少熱透鏡效應的 UltraFast Innovations (UFI) 1030nm 高色散超快反射鏡,適用於孔腔內應用、超快高能量振盪器,以及 Yb:YAG 薄片雷射系統等放大器。如果您的雷射系統需要客製尺寸、波長或脈衝輪廓,請與我們聯絡。

 
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