12.7mm Dia. Uncoated, Silicon, Laser Mirror

Volume Pricing
Qty 1+	NT$2,800 each
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Specifications

概況

Type:

Laser Mirror Substrate

物理和機械特性

Parallelism (arcmin):

<3

Clear Aperture (%):

90

Back Surface:

Commercial Polish

Diameter (mm):

12.70 +0.00/-0.10

Thickness (mm):

3.18 ±0.10

光學特性

Surface Quality:

40-20

Coating Specification:

N/A

Surface Flatness (P-V):

λ/10

Coating:

Uncoated

Optical Grade Silicon

Regulatory Compliance

Certificate of Conformance:

View

產品概覽

Silicon Substrate for Thermally Demanding Ultrafast Setups
λ/10 Surface Flatness and 40-20 Surface Quality
Available In Standard Diameters for Coating Flexibility and System Integration

TECHSPEC® Silicon Laser Mirror Substrates feature a high-thermal-conductivity silicon substrate designed for thermally demanding high-power and ultrafast laser applications. Optimized for efficient heat distribution in challenging optical setups, these substrates help mitigate thermally induced wavefront distortion. Designed as a coating-ready platform, TECHSPEC® Silicon Laser Mirror Substrates provide a flexible foundation for custom broadband or low-dispersion mirror solutions. Available in 12.7mm, 25.4mm, and 50.8mm diameters, these mirrors offer flexibility for integration into a wide range of laser system configurations.