600 - 1000nm, 25.4mm Dia. Uncoated, Silicon, Laser Mirror

• Silicon Substrate for Thermally Demanding Ultrafast Setups
• λ/10 Surface Flatness and 40-20 Surface Quality
• Available In Standard Diameters for Coating Flexibility and System Integration

TECHSPEC® Silicon Laser Mirror Substrates feature a high-thermal-conductivity silicon substrate designed for thermally demanding high-power and ultrafast laser applications. Optimized for efficient heat distribution in challenging optical setups, these substrates help mitigate thermally induced wavefront distortion. Designed as a coating-ready platform, TECHSPEC® Silicon Laser Mirror Substrates provide a flexible foundation for custom broadband or low-dispersion mirror solutions. Available in 12.7mm, 25.4mm, and 50.8mm diameters, these mirrors offer flexibility for integration into a wide range of laser system configurations.