High Energy λ/4 Waveplate, 50mm Dia. Mounted 650nm

Name: High Energy λ/4 Waveplate, 50mm Dia. Mounted 650nm
SKU: 91-508
Price: 58625.00 TWD

Stock #91-508 New 1 庫存

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NT$58,625

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Qty 1-9	NT$58,625 each
Qty 10-25	NT$46,900 each
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Specifications
產品概覽
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Specifications

概況

Type:

Inorganic Waveplate

Note:

Fast axis parallel to marking on edge of optic

物理和機械特性

Clear Aperture CA (mm):

42.00

Diameter (mm):

50.00 ±0.2

Construction:

Wire Grid

Substrate Thickness (mm):

1.53 (1.4mm combined thickness of substrates with ~0.13 air gap between them)

光學特性

Design Wavelength DWL (nm):

650nm ±7nm

Display Glass

Retardance:

λ/4 ± λ/120 between 0 and 30° AOI

Coating Specification:

S1: None S2: AR-Coating

180 kW/cm² at 455 nm
4.5 MW/cm² at 532 nm

Transmitted Wavefront Distortion:

≤λ/4

Fast Axis Tolerance (°):

±1

螺紋和安裝

Mount Thickness (mm):

5.80 ±0.2

Mount:

Anodized Aluminum Mount

環境和耐用性因素

Operating Temperature (°C):

-40 to 350

Regulatory Compliance

RoHS 2015:

Compliant

Certificate of Conformance:

View

Reach 253:

Compliant

產品概覽

Consistent Retardation from -40°C to +350°C
Suitable for Humid Environments
Ideal for Applications Requiring Wide Acceptance Angles
Available in Square and Circular Configurations from 12.7 to 50.8mm

Harsh Environment Waveplates (Retarders) are designed for exceptional performance in high-temperature, humid environments. Able to withstand temperatures from -40 °C to 350 °C with no decrease in performance, these inorganic waveplates operate at an Angle of Incidence (AOI) up to 30°, making them ideal for projection, illumination, and remote sensing applications. Harsh Environment Waveplates (Retarders) feature an aluminum nanowire construction and a resistance to temperature cycling, UV exposure, and laser damage.

Note: The active nanowire surface of the waveplate is extremely delicate, and nothing should be allowed to touch it, as this can damage the optic. Only dry air is recommended for cleaning. If necessary, this optic should only be handled by the edges with appropriate optical handling techniques.