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Coherent® LightSmyth™ 奈米圖案矽印模

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  • 奈米級質地的溝槽表面
  • 各種不同溝槽週期和溝槽深度
  • 適用於奈米光子研究應用

Coherent® LightSmyth™ 奈米圖案矽印模，是由在單晶矽基材製作圖案的奈米級質地表面所組成。透過反應式離子蝕刻技術，在基材表面蝕刻具有梯形截面的線性溝槽，類似於傳統光柵。蝕刻製程可讓溝槽具有不同的週期和深度規格，並可製作晶格等更複雜的圖形。Coherent® LightSmyth™ 奈米圖案矽印模是奈米光子研究應用的理想選擇，適用領域涵蓋光學及光子、生物、化學、奈米壓印及微流控。

注意：II-VI Incorporated 已變更為 Coherent Corp.

SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)
 
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